E E 432: Microelectronics Fabrication Techniques
(Dual-listed with E E 532). (Cross-listed with MAT E). (2-4) Cr. 4.
Prereq: CPR E and E E majors: E E 230; MAT E majors: MAT E 317
Techniques used in modern integrated circuit fabrication, including diffusion, oxidation, ion implantation, lithography, evaporation, sputtering, chemical-vapor deposition, and etching. Process integration. Process evaluation and final device testing. Extensive laboratory exercises utilizing fabrication methods to build electronic devices. Use of computer simulation tools for predicting processing outcomes. Recent advances in processing CMOS ICs and micro-electro-mechanical systems (MEMS).
A B E 432: Nonpoint Source Pollution and Control
(Dual-listed with A B E 532). (3-0) Cr. 3. Alt. S., offered irregularly.
Prereq: A B E 431 or C E 372
Characteristics and mechanisms of non-point source (NPS) pollution in agricultural and urban watersheds, modeling of NPS pollution for terrestrial and aquatic systems, statistical tools to assess environmental datasets, strategies to control and manage NPS pollution of water bodies, and integrated watershed management. Graduate students are required to develop/deliver lecture models on assigned topics and/or complete additional assignments.
AER E 432: Flight Control Systems II
(3-0) Cr. 3. F.
Prereq: AER E 331
Aircraft lateral directional stability augmentation. Launch vehicle pitch control system design. Control of flexible vehicles. Satellite attitude control. Flight control designs based on state-space methods. Introduction to sample-data systems.
I E 432: Industrial Automation
(2-3) Cr. 3. S.
Prereq: PHYS 232; PHYS 232L
Overview of electrical circuit theory and its relationship to industrial control systems. Theory and application of transducers in the form of sensors and actuators, with applications in manufacturing, distribution and mechanical systems. Programmable Logic Controllers (PLC), their programming and use for automation solutions. Introduction of automated identification systems such as Radio Frequency Identification (RFID) and Bar Coding technologies.
MAT E 432: Microelectronics Fabrication Techniques
(Dual-listed with M S E 532). (Cross-listed with E E). (2-4) Cr. 4.
Prereq: CPR E and E E majors: E E 230; MAT E majors: MAT E 317
Techniques used in modern integrated circuit fabrication, including diffusion, oxidation, ion implantation, lithography, evaporation, sputtering, chemical-vapor deposition, and etching. Process integration. Process evaluation and final device testing. Extensive laboratory exercises utilizing fabrication methods to build electronic devices. Use of computer simulation tools for predicting processing outcomes. Recent advances in processing CMOS ICs and micro-electro-mechanical systems (MEMS).